HSN Code 84569100 - Machine tools for working any material by removal of material by laser or other light or photon beam ultra sonic electro discharge electrochemical electron beam ionic beam or plasma arc processes other for dry etching patterns on semi conductor materials
HSN Code (Classification) | Description |
|---|---|
| 84(Chapter) | Nuclear reactors, boilers, machinery and mechanical appliances; parts thereof |
| 8456(Heading) | Machine-tools for working any material by removal of material, by laser or other light orphoton beam, ultra-sonic, electro-discharge, electro-chemical, electron beam, ionic-beam or plasma arc processes, water-jet cutting machines |
| 84569100(Item) | Machine-tools for working any material by removal of material, by laser or other light or photon beam, ultra-sonic, electro-discharge, electrochemical, electron beam, ionic-beam or plasma arc processes - other: for dry-etching patterns on semi-conductor materials |
84569100(Item) | Machine-tools for working any material by removal of material, by laser or other light or photon beam, ultra-sonic, electro-discharge, electrochemical, electron beam, ionic-beam or plasma arc processes - other: for dry-etching patterns on semi-conductor materials |
HSN Code
84
Description
Nuclear reactors, boilers, machinery and mechanical appliances; parts thereof
HSN Code
8456
Description
Machine-tools for working any material by removal of material, by laser or other light orphoton beam, ultra-sonic, electro-discharge, electro-chemical, electron beam, ionic-beam or plasma arc processes, water-jet cutting machines
HSN Code
84569100
Description
Machine-tools for working any material by removal of material, by laser or other light or photon beam, ultra-sonic, electro-discharge, electrochemical, electron beam, ionic-beam or plasma arc processes - other: for dry-etching patterns on semi-conductor materials
HSN Code
84569100
Description
Machine-tools for working any material by removal of material, by laser or other light or photon beam, ultra-sonic, electro-discharge, electrochemical, electron beam, ionic-beam or plasma arc processes - other: for dry-etching patterns on semi-conductor materials